Horizontal Grip Photmask Pick
|Wafer Size||5 in, 6 in, 7 in, 9 in|
|Dimensions||15 × 2 × 3 in|
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Horizontal antistatic photomask picks handle across the mask, contacting the tangential edges of the mask to reduce contaminationby eliminating direct contact with the mask chrome area. MPH2 tools are designed with a 15° angle handle allowing for mask placement into photo process, metrology or storage containers. Designed for ISO Class 3 (FS209E Class 1) Antistatic construction, chemical resistant
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